Thin Film Deposition

Evaporator Kurt J. Lesker PVD200 Pro line

The evaporator features both an electron beam source and a thermal evaporation source, capable of handling samples up to 200 mm in diameter. It also includes adjustable deposition height controls, providing flexibility for precise and high-quality film deposition.

Evaporator Kurt J. Lesker LAB18

The evaporator features a thermal evaporation source, an electron beam source, and an ion-assisted deposition system, providing a comprehensive solution for versatile deposition techniques and ensuring superior film quality and adhesion.

Evaporator Leybold Univex 350

The evaporator is equipped with a thermal evaporation source and an electron beam source, offering a versatile setup for various deposition techniques. It accommodates a wide range of sample mounts and materials, ensuring flexible and high-quality film deposition.

Sputtering AJA Orion 8 HV

The sputtering system generates plasma to accelerate ions towards a target material, which is then bombarded to release atoms. These ejected atoms deposit onto a substrate, forming a thin film with precise control over thickness and composition.

Coater Leica EM ACE600

The Leica EM ACE600 is a versatile coating system designed for precise sample preparation for subsequent examination with electron microscopy. It is capable of both sputter and carbon coating and has integrated thickness measurement.

ALD Veeco Fiji G2

This ALD system provides both thermal and plasma-enhanced deposition capabilities, functioning under high vacuum for precise thin film growth, making it versatile for various material deposition applications. It also includes a load lock chamber for easy substrate handling.

ALD Veeco Fij

This thermal ALD system deposits thin films with atomic precision by alternating between a material-specific precursor and water on a heated substrate. The process relies on surface-limited reactions, ensuring uniform and conformal layer growth.