Optical Lithography

Maskless Aligner Heidelberg MLA150

The MLA150 is a high-speed direct-write lithography tool that eliminates the need for mask fabrication, greatly reducing prototyping time. It features both topside and backside alignment with high precision, and a powerful light source capable of exposing thick and less sensitive resists. The system works with substrates of all sizes and shapes, offering flexible pattern adjustments, distortion correction and other software features to enhance accuracy.

Mask Aligner Quintel Q400

The mask aligner is a tool used in photolithography to transfer patterns from a photomask onto a coated substrate by aligning and exposing it to UV light. It provides precise alignment between the mask and substrate, enabling high-resolution patterning for microfabrication while allowing for fast processing times.

Laser Writer Microtech LW405B

The Laser Writer is an advanced optical lithography tool that utilizes focused laser beams to directly expose photosensitive materials on a substrate, enabling high-resolution patterning without the need for photomasks. This system allows for rapid design changes and efficiently creates intricate patterns at varying scales, making it particularly useful for prototyping.